11 results
Influence of Process Parameters on Resistive Switching in MOCVD NiO Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1337 / 2011
- Published online by Cambridge University Press:
- 27 July 2011, mrss11-1337-q07-09
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- 2011
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Mississippi's Infectious Disease Hotline: A Surveillance and Education Model for Future Disasters
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- Journal:
- Prehospital and Disaster Medicine / Volume 24 / Issue 1 / February 2009
- Published online by Cambridge University Press:
- 28 June 2012, pp. 11-17
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- February 2009
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A Comparison of Spike, Flash, SPER and Laser Annealing for 45nm CMOS
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- Journal:
- MRS Online Proceedings Library Archive / Volume 765 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, D7.4
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- 2003
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Low Temperature Formation of C54 TiSi2 Bypassing the C49 Phase: Effect of Si Crystallinity, Metallic Impurities and Applications TO 0.10 μm CMOS
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- Journal:
- MRS Online Proceedings Library Archive / Volume 514 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 201
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- 1998
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Optimization of Ti and Co Self-Aligned Silicide RTP for 0.10 μm CMOS
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- Journal:
- MRS Online Proceedings Library Archive / Volume 514 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 255
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- 1998
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Effect of Mo Doping on Formation of Ti-Silicide Phases Studied by HRTEM
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- Journal:
- MRS Online Proceedings Library Archive / Volume 523 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 91
- Print publication:
- 1998
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Optimization of Ti and Co Self-Aligned Silicide RTP for 0.10 μm Cmos
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- Journal:
- MRS Online Proceedings Library Archive / Volume 525 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 331
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- 1998
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Modeling of Device Characteristics as Function of Ti Salicide Rapid Thermal Processing Parameters for Deep-Sub-Micron CMOS Technologies
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- Journal:
- MRS Online Proceedings Library Archive / Volume 429 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 175
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- 1996
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Mechanisms of Thin Film Ti And Co Silicide Phase Formation on Deep-Sub-Micron Geometries and Their Implications and Applications To 0.18 °m CMOS and Beyond
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- Journal:
- MRS Online Proceedings Library Archive / Volume 427 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 505
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- 1996
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Kinetics of the C49 TO C54 Phase Transformation in TiSi2 thin Films on Deep-Sub-Micron Lines
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- Journal:
- MRS Online Proceedings Library Archive / Volume 402 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 269
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- 1995
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Congruent Melting Temperatures of Si-As Alloys Measured During Pulsed-Laser Melting and Rapid Solidification
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- Journal:
- MRS Online Proceedings Library Archive / Volume 279 / 1992
- Published online by Cambridge University Press:
- 25 February 2011, 691
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- 1992
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